DSpace Repository

Two-dimensional Photonic Crystals Fabricated by Nanoimprint Lithography

Show simple item record

dc.creator Chen, A.
dc.creator Chua, Soo-Jin
dc.creator Fonstad, Clifton G. Jr.
dc.creator Wang, B.
dc.creator Wilhelmi, O.
dc.date 2004-12-10T14:33:12Z
dc.date 2004-12-10T14:33:12Z
dc.date 2005-01
dc.date.accessioned 2013-10-09T02:49:26Z
dc.date.available 2013-10-09T02:49:26Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/7374
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description We report on the process parameters of nanoimprint lithography (NIL) for the fabrication of two-dimensional (2-D) photonic crystals. The nickel mould with 2-D photonic crystal patterns covering the area up to 20mm² is produced by electron-beam lithography (EBL) and electroplating. Periodic pillars as high as 200nm to 250nm are produced on the mould with the diameters ranging from 180nm to 400nm. The mould is employed for nanoimprinting on the poly-methyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mould are well transferred. This nanometer-size structure provided by NIL is subjective to further pattern transfer.
dc.description Singapore-MIT Alliance (SMA)
dc.format 169755 bytes
dc.format application/pdf
dc.language en
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject 2-D photonic crystals
dc.subject nanoimprinting
dc.subject Ni mould fabrication
dc.subject electron-beam lithography
dc.subject electroplating
dc.subject nanoimprint lithography
dc.title Two-dimensional Photonic Crystals Fabricated by Nanoimprint Lithography
dc.type Article

Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search DSpace

Advanced Search


My Account