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Inorganic x-ray mask technology for quantum-effect devices

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dc.contributor Chu, William.
dc.date 2004-03-02T18:29:03Z
dc.date 2004-03-02T18:29:03Z
dc.date 1993
dc.date.accessioned 2013-10-09T02:34:22Z
dc.date.available 2013-10-09T02:34:22Z
dc.date.issued 2013-10-09
dc.identifier no. 577
dc.identifier http://hdl.handle.net/1721.1/4176
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description William Chu.
dc.description Includes bibliographical references (p. 116-123).
dc.description Supported in part by the Joint Services Electronics Program. DAAL03-92-C-0001 Supported in part by the National Science Foundation. ECS 90-16437 Supported in part by the U.S. Air Force Office of Scientific Research, and the Defense Advanced Research Projects Agency. N00019-92-K-0021
dc.format 123 p.
dc.format 9596652 bytes
dc.format application/pdf
dc.language eng
dc.publisher Research Laboratory of Electronics, Massachusetts Institute of Technology
dc.relation Technical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 577.
dc.subject TK7855.M41 R43 no.577
dc.title Inorganic x-ray mask technology for quantum-effect devices


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