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Defect centers in a-SiNx: electronic and structural properties

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dc.creator Mota F. de Brito
dc.creator Justo J. F.
dc.creator Fazzio A.
dc.date 2002
dc.date.accessioned 2013-06-01T09:13:17Z
dc.date.available 2013-06-01T09:13:17Z
dc.date.issued 2013-06-01
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332002000200055
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2002&volume=32&issue=2a&spage=436
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/7739
dc.description By combining ab initio methods and interatomic potentials, we investigated the electronic and the structural properties of amorphous silicon nitride. Our results show the trends on the electronic band structure of SiNx (0.5 < x < 1.8) as the nitrogen content changes, and are in good agreement with the experimental data.Hydrogenation of the systems was found to considerably reduce the number of energy levels in the gap. The energy levels which appeared in the materials band gap were compared to the electrically active centers, which have been identified by electron-paramagnetic resonance experiments.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Defect centers in a-SiNx: electronic and structural properties


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