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Carbon doping of InAlAs layers grown by metalorganic vapor phase epitaxy

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dc.creator Ribeiro M. L. P.
dc.creator Yavich B.
dc.creator Tribuzy C. V. B.
dc.creator Souza P. L.
dc.date 2002
dc.date.accessioned 2013-05-30T01:54:22Z
dc.date.available 2013-05-30T01:54:22Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332002000200032
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2002&volume=32&issue=2a&spage=362
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/3438
dc.description Carbon doped AlInAs layers grown by low pressure metalorganic vapor phase epitaxy are investigated as a function of growth temperature. Photoluminescence spectra show a significant drop in peak intensity as the growth temperature is reduced, due to the incorporation of non-radiative defects. It is shown that the C doping is not related to the deterioration of the optical properties of the layers. On the other hand, both the net hole concentration and the conductivity increase as the growth temperature is reduced due to a more efficient C incorporation and a lower incorporation of the passivating H atoms.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Carbon doping of InAlAs layers grown by metalorganic vapor phase epitaxy


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