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In-situ determination of indium segregation in InGaAs/GaAs quantum wells grown by molecular beam epitaxy

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dc.creator Martini S.
dc.creator Quivy A. A.
dc.date 2002
dc.date.accessioned 2013-05-30T01:53:52Z
dc.date.available 2013-05-30T01:53:52Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332002000200031
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2002&volume=32&issue=2a&spage=359
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/3436
dc.description The surface segregation of indium atoms during the growth of InGaAs/GaAs heterostructures has been investigated in situ by reflection high-energy electron diffraction (RHEED). We pointed out that strong damping of the RHEED oscillations during the deposition of InGaAs on GaAs was related to the segregation strength of indium atoms in the InGaAs layer. A simple model shows that the decay constant of the RHEED oscillations may be used to determine accurately the segregation coefficient R, as confirmed by photoluminescence (PL) measurements.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title In-situ determination of indium segregation in InGaAs/GaAs quantum wells grown by molecular beam epitaxy


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