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Plasma-deposited a-C(N): H films

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dc.creator Franceschini D.F.
dc.date 2000
dc.date.accessioned 2013-05-30T00:11:51Z
dc.date.available 2013-05-30T00:11:51Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332000000300007
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2000&volume=30&issue=3&spage=517
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/3015
dc.description The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Plasma-deposited a-C(N): H films


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