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Recent progress in the synthesis and characterization of amorphous and crystalline carbon nitride coatings

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dc.creator Widlow Ian
dc.creator Chung Yip-Wah
dc.date 2000
dc.date.accessioned 2013-05-30T00:10:19Z
dc.date.available 2013-05-30T00:10:19Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332000000300004
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2000&volume=30&issue=3&spage=490
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/3006
dc.description This review summarizes our most recent findings in the structure and properties of amorphous and crystalline carbon nitride coatings, synthesized by reactive magnetron sputtering. By careful control of the plasma conditions via proper choice of process parameters such as substrate bias, target power and gas pressure, one can precisely control film structure and properties. With this approach, we were able to produce amorphous carbon nitride films with controlled hardness and surface roughness. In particular, we can synthesize ultrathin (1 nm thick) amorphous carbon nitride films to be sufficiently dense and uniform that they provide adequate corrosion protection for hard disk applications. We demonstrated the strong correlation between ZrN(111) texture and hardness in CNx/ZrN superlattice coatings. Raman spectroscopy and near-edge x-ray absorption show the predominance of sp³-bonded carbon in these superlattice coatings.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Recent progress in the synthesis and characterization of amorphous and crystalline carbon nitride coatings


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