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Impurity breakdown in GaAs samples grown by molecular beam Epitaxy

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dc.creator Rubinger R.M.
dc.creator Oliveira A.G. de
dc.creator Ribeiro G.M.
dc.creator Bezerra J.C.
dc.creator Silva C.M.
dc.creator Rodrigues W.N.
dc.creator Moreira M.V.B.
dc.date 1999
dc.date.accessioned 2013-05-29T23:36:26Z
dc.date.available 2013-05-29T23:36:26Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400038
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=793
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/2805
dc.description In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by Molecular Beam Epitaxy at 200°C and 300°C. We vary the temperature and the illumination intensity. For the sample grown at 200°C, the transport mechanism after the breakdown is of the same type of the main free carriers at low electric fields. Below 100K, a clear dependence of the threshold electric field with temperature was observed. The sample grown at 300°C shows a breakdown due to an acceptor level at 41meV from the valence band. The threshold electric field increases with illumination due to the generation of free electrons by deep levels. A similar behavior was also observed for a Cr doped GaAs sample.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Impurity breakdown in GaAs samples grown by molecular beam Epitaxy


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