Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy

dc.creator	Gutiérrez H.R.
dc.creator	Cotta M.A.
dc.creator	Nakaema W.M.
dc.creator	Carvalho M.M.G.de
dc.creator	Gobbi A.L.
dc.date	1999
dc.date.accessioned	2013-05-29T23:32:55Z
dc.date.available	2013-05-29T23:32:55Z
dc.date.issued	2013-05-30
dc.identifier	http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031
dc.identifier	http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=764
dc.identifier.uri	http://koha.mediu.edu.my:8181/jspui/handle/123456789/2784
dc.description	We have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.
dc.publisher	Sociedade Brasileira de Física
dc.source	Brazilian Journal of Physics
dc.title	Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy

الملفات في هذه المادة

الملفات	الحجم	الصيغة	عرض
لا توجد أي ملفات مرتبطة بهذه المادة.