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Influence of laser excitation on raman and photoluminescence spectra and FTIR study of porous silicon layers

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dc.creator Salcedo Walter Jaimes
dc.creator Ramirez Fernandez Francisco J.
dc.creator Rubimc Joel C.
dc.date 1999
dc.date.accessioned 2013-05-29T23:31:25Z
dc.date.available 2013-05-29T23:31:25Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400028
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=751
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/2775
dc.description A porous silicon lm (PS) was investigated by FTIR, Raman and photoluminescence (PL) spectroscopies. The Raman and PL spectra were obtained using four different laser excitations: 488, 514, 633 and 782 nm. The analysis of the first order and second order Raman scattering lines permits to identify the band energy structure of the crystallites inside the PS film. The analysis of PL spectra shows that the intensity and full width at half-maximum values of PL emission depends on intensity and energy of laser excitation. The linear polarization degree (LPD) of the PL spectra also presents a dependence of laser excitation. The observed dependence of Raman and PL spectra due to laser excitation energy cannot be explained within the quantum confinement alone. We propose a mechanism for PL emission in PS layers, in which the radiative recombination occurs in localized centers at pore/crystallite interface. These quasi-molecular centers are Jahn-Teller active.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Influence of laser excitation on raman and photoluminescence spectra and FTIR study of porous silicon layers


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