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Ambipolar carrier diffusion in In0.53Ga0.47As single quantum wells

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dc.creator Monte A.F.G.
dc.creator Silva S.W. da
dc.creator Cruz J.M.R.
dc.creator Morais P.C.
dc.creator Cox H.M.
dc.date 1999
dc.date.accessioned 2013-05-29T23:24:24Z
dc.date.available 2013-05-29T23:24:24Z
dc.date.issued 2013-05-30
dc.identifier http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400014
dc.identifier http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=690
dc.identifier.uri http://koha.mediu.edu.my:8181/jspui/handle/123456789/2732
dc.description The microluminescence surface scan technique (MSST) has been used to investigate photocarrier diffusion in undoped In0.53Ga0.47 As - InP single quantum well (QW), in the temperature (T) range from 15 K to 295 K. Narrowing of the photoluminescence (PL) spatial profile is observed as the temperature is lowered, indicating reduction of the photocarrier diffusion length upon cooling. It was found that the width of the PL spatial profile follows a linear function of temperature, but a change in slope by a factor of 2.6 is observed at about 200 K, indicating a change of the dominant carrier scattering mechanism. In the temperature range of 15 K to 200 K, the ambipolar photocarrier diffusion mechanism seems to be correlated to impurity states thermally activated.
dc.publisher Sociedade Brasileira de Física
dc.source Brazilian Journal of Physics
dc.title Ambipolar carrier diffusion in In0.53Ga0.47As single quantum wells


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