| dc.creator |
Bastiaansen, Cees |
|
| dc.creator |
Broer, Dirk, J. |
|
| dc.creator |
Sánchez-Somolinos, Carlos |
|
| dc.date |
2008-04-07T12:22:32Z |
|
| dc.date |
2008-04-07T12:22:32Z |
|
| dc.date |
2006-08-17 |
|
| dc.date.accessioned |
2017-01-31T01:01:36Z |
|
| dc.date.available |
2017-01-31T01:01:36Z |
|
| dc.identifier |
International Publication Number: WO 2006/085757 A3 |
|
| dc.identifier |
http://hdl.handle.net/10261/3457 |
|
| dc.identifier.uri |
http://dspace.mediu.edu.my:8181/xmlui/handle/10261/3457 |
|
| dc.description |
Filing Date: 2006-02-09. --Priority Data: NL PCT/NL2005/000106 (2005-02-09) |
|
| dc.description |
The present invention relates to a process for the preparation of a polymeric relief structure by a) coating a substrate with a first coating composition comprising one or more radiation-sensitive ingredients, d) locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, e) polymerizing and/or crosslinking the resulting coated substrate to a first coating. This process is improved by applying a second coating composition on top of the first coating composition, said second coating composition comprising either an organic compound (Co) of a monomeric nature and wherein Co is also polymerized during the process, or wherein said second coating comprises a dissolved polymer (Cp). As a result a polymeric relief structure is obtained, where a substrate is coated with a functional, stacked, bi-layer, in which each layer exhibits a specific, and from each other differing function. |
|
| dc.format |
151821 bytes |
|
| dc.format |
application/pdf |
|
| dc.language |
eng |
|
| dc.rights |
openAccess |
|
| dc.title |
Process for preparing a polymeric relief structure |
|
| dc.type |
Patente |
|