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Large area fabrication method based on the local oxidation of silicon and/or differents materials on Micro- and Nano-Scale

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dc.creator García García, Ricardo
dc.date 2008-04-07T11:56:08Z
dc.date 2008-04-07T11:56:08Z
dc.date 2005-05-06
dc.date.accessioned 2017-01-31T01:01:36Z
dc.date.available 2017-01-31T01:01:36Z
dc.identifier International Publication Number: WO 2005/040037 A1
dc.identifier http://hdl.handle.net/10261/3456
dc.identifier.uri http://dspace.mediu.edu.my:8181/xmlui/handle/10261/3456
dc.description Filing Date: 2004-10-19. --Priority Data: IT BO2003A000614 (2003-10-20)
dc.description Process for local oxidation of a surface to be oxidized on micro and nano scale, including: i) the application of a stamp, made of or covered with a conductive material, with motives in relief of sub-micrometer or nanometer size, on or over said surface to be oxidized, in an atmosphere of gas having a controlled content of electrolyte vapours and ii) the application of an electric voltage between the stamp, connected to the negative pole, and the surface to be oxidized, connected to the positive pole.
dc.format 1468804 bytes
dc.format application/pdf
dc.language eng
dc.rights openAccess
dc.title Large area fabrication method based on the local oxidation of silicon and/or differents materials on Micro- and Nano-Scale
dc.type Patente


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