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dc.creator Martínez Rodríguez, Luis Javier
dc.creator Sánchez Losilla, Nuria
dc.creator Biscarini, Fabio
dc.creator Schmidt, Georg
dc.creator Borzenko, Tanja
dc.creator Molenkamp, Laurens W.
dc.creator García García, Ricardo
dc.date 2008-01-31T18:33:37Z
dc.date 2008-01-31T18:33:37Z
dc.date 2006-08-22
dc.date.accessioned 2017-01-31T00:59:54Z
dc.date.available 2017-01-31T00:59:54Z
dc.identifier Review of Scientific Instruments 77, 086106 2006
dc.identifier 0034-6748
dc.identifier http://hdl.handle.net/10261/2817
dc.identifier 10.1063/1.2336773
dc.identifier.uri http://dspace.mediu.edu.my:8181/xmlui/handle/10261/2817
dc.description We have developed an instrument to perform local oxidation nanofabrication processes in parallel. The instrument has three major components, the stamp holder, the sample base, and the supporting frame. The sample base is actuated by three precision screws that enable motion in the three orthogonal directions. Sample base and stamp holder are enclosed and sealed inside a chamber with two inlets to introduce different gases. The chamber is supported by a rigid frame. We show the parallel patterning of silicon oxide features on silicon surfaces by the application of a bias voltage between the sample and the stamp when they are in contact. Arrays of parallel lines separated by 100 nm have been patterned over cm2 regions in one minute.
dc.description This work was financially supported by the MCyT (Spain) (MAT2003-02655) and the EU integrated project NAIMO (Grant No. NMP4-CT-2004-500355).
dc.description Peer reviewed
dc.format 1090178 bytes
dc.format application/pdf
dc.language eng
dc.publisher American Institute of Physics
dc.rights openAccess
dc.title Development of a parallel local oxidation nanolithography instrument
dc.type Artículo


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أعرض تسجيلة المادة بشكل مبسط