We have developed an instrument to perform local oxidation nanofabrication processes in parallel. The instrument has three major components, the stamp holder, the sample base, and the supporting frame. The sample base is actuated by three precision screws that enable motion in the three orthogonal directions. Sample base and stamp holder are enclosed and sealed inside a chamber with two inlets to introduce different gases. The chamber is supported by a rigid frame. We show the parallel patterning of silicon oxide features on silicon surfaces by the application of a bias voltage between the sample and the stamp when they are in contact. Arrays of parallel lines separated by 100 nm have been patterned over cm2 regions in one minute.This work was financially supported by the MCyT (Spain) (MAT2003-02655) and the EU integrated project NAIMO (Grant No. NMP4-CT-2004-500355).Peer reviewed