Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/5029
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dc.contributorEisenstein, A. S.-
dc.date2004-03-03T22:19:04Z-
dc.date2004-03-03T22:19:04Z-
dc.date1946-
dc.date.accessioned2013-10-09T02:37:20Z-
dc.date.available2013-10-09T02:37:20Z-
dc.date.issued2013-10-09-
dc.identifierno. 17-
dc.identifierhttp://hdl.handle.net/1721.1/5029-
dc.identifier.urihttp://koha.mediu.edu.my:8181/xmlui/handle/1721-
dc.description[by] A. Eisenstein.-
dc.description"Reprinted from Journal of applied physics, vol. 17, No. 11, 874-878, November, 1946."-
dc.descriptionIncludes bibliographical references.-
dc.formatp. 874-878-
dc.format487443 bytes-
dc.formatapplication/pdf-
dc.languageeng-
dc.publisherResearch Laboratory of Electronics, Massachusetts Institute of Technology-
dc.relationTechnical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 17.-
dc.subjectTK7855.M41 R43 no.17-
dc.subjectThin films-
dc.titleAn x-ray method for measuring the thickness of thin crystalline films-
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