Ion beam enhanced grain growth in thin films

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DC Field	Value	Language
dc.contributor	Atwater, Harry Albert, 1960-	-
dc.date	2004-03-02T18:51:18Z	-
dc.date	2004-03-02T18:51:18Z	-
dc.date	1987	-
dc.date.accessioned	2013-10-09T02:34:30Z	-
dc.date.available	2013-10-09T02:34:30Z	-
dc.date.issued	2013-10-09	-
dc.identifier	no 527	-
dc.identifier	http://hdl.handle.net/1721.1/4216	-
dc.identifier.uri	http://koha.mediu.edu.my:8181/xmlui/handle/1721	-
dc.description	Harry Albert Atwater, Jr.	-
dc.description	Bibliography: p. 213-224.	-
dc.description	Supported in part by the National Science Foundation ECS-85-06565 Supported in part by the U.S. Air Force grnat AFOSR 85-0154C	-
dc.format	224 p.	-
dc.format	8891532 bytes	-
dc.format	application/pdf	-
dc.language	eng	-
dc.publisher	Massachusetts Institute of Technology, Research Laboratory of Electronics	-
dc.relation	Technical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 527.	-
dc.subject	TK7855.M41 R43 no.527	-
dc.title	Ion beam enhanced grain growth in thin films	-
Appears in Collections:	MIT Items

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