Inorganic x-ray mask technology for quantum-effect devices

Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/4176

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DC Field	Value	Language
dc.contributor	Chu, William.	-
dc.date	2004-03-02T18:29:03Z	-
dc.date	2004-03-02T18:29:03Z	-
dc.date	1993	-
dc.date.accessioned	2013-10-09T02:34:22Z	-
dc.date.available	2013-10-09T02:34:22Z	-
dc.date.issued	2013-10-09	-
dc.identifier	no. 577	-
dc.identifier	http://hdl.handle.net/1721.1/4176	-
dc.identifier.uri	http://koha.mediu.edu.my:8181/xmlui/handle/1721	-
dc.description	William Chu.	-
dc.description	Includes bibliographical references (p. 116-123).	-
dc.description	Supported in part by the Joint Services Electronics Program. DAAL03-92-C-0001 Supported in part by the National Science Foundation. ECS 90-16437 Supported in part by the U.S. Air Force Office of Scientific Research, and the Defense Advanced Research Projects Agency. N00019-92-K-0021	-
dc.format	123 p.	-
dc.format	9596652 bytes	-
dc.format	application/pdf	-
dc.language	eng	-
dc.publisher	Research Laboratory of Electronics, Massachusetts Institute of Technology	-
dc.relation	Technical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 577.	-
dc.subject	TK7855.M41 R43 no.577	-
dc.title	Inorganic x-ray mask technology for quantum-effect devices	-
Appears in Collections:	MIT Items

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