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http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/3985Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.creator | Li, Baojun | - |
| dc.creator | Chua, Soo-Jin | - |
| dc.creator | Fitzgerald, Eugene A. | - |
| dc.creator | Leitz, Christopher W. | - |
| dc.creator | Miao, Lingyun | - |
| dc.date | 2003-12-22T20:46:31Z | - |
| dc.date | 2003-12-22T20:46:31Z | - |
| dc.date | 2002-01 | - |
| dc.date.accessioned | 2013-10-09T02:33:27Z | - |
| dc.date.available | 2013-10-09T02:33:27Z | - |
| dc.date.issued | 2013-10-09 | - |
| dc.identifier | http://hdl.handle.net/1721.1/3985 | - |
| dc.identifier.uri | http://koha.mediu.edu.my:8181/xmlui/handle/1721 | - |
| dc.description | A near infrared waveguide photodetector in Si-based ternary Si₁â xâ yGexCy alloy was demonstrated for 0.85~1.06 µm wavelength fiber-optic interconnection system applications. Two sets of detectors with active absorption layer compositions of Si₀.₇₉Ge₀.₂C₀.₀₁ and Si₀.₇₀Ge₀.₂₈C₀.₀₂ were designed. The active absorption layer has a thickness of 120~450 nm. The external quantum efficiency can reach ~3% with a cut-off wavelength of around 1.2 µm. | - |
| dc.description | Singapore-MIT Alliance (SMA) | - |
| dc.format | 484917 bytes | - |
| dc.format | application/pdf | - |
| dc.language | en_US | - |
| dc.relation | Advanced Materials for Micro- and Nano-Systems (AMMNS); | - |
| dc.subject | photodetector | - |
| dc.subject | quantum efficiency | - |
| dc.subject | absorption coefficient | - |
| dc.subject | absorption efficiency | - |
| dc.subject | band gap | - |
| dc.subject | lattice constant | - |
| dc.subject | critical thickness | - |
| dc.subject | SiGeC | - |
| dc.subject | semiconductor | - |
| dc.subject | alloy | - |
| dc.title | SiGeC Near Infrared Photodetectors | - |
| dc.type | Article | - |
| Appears in Collections: | MIT Items | |
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