Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/3829
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dc.creatorZhu, Tie-Jun-
dc.creatorLu, Li-
dc.creatorThompson, Carl V.-
dc.date2003-12-13T16:43:24Z-
dc.date2003-12-13T16:43:24Z-
dc.date2004-01-
dc.date.accessioned2013-10-09T02:32:39Z-
dc.date.available2013-10-09T02:32:39Z-
dc.date.issued2013-10-09-
dc.identifierhttp://hdl.handle.net/1721.1/3829-
dc.identifier.urihttp://koha.mediu.edu.my:8181/xmlui/handle/1721-
dc.descriptionPulsed laser deposition has been used to grow Pb(Zr₀.₅₂Ti₀.₄₈)O₃ (PZT)/LaNiO₃ (LNO) heterostructures with restricted crystallographic orientations on bare Si(001) and SiO₂-coated Si(001) substrates, using TiN buffer layers. The effect of background gas pressure on orientation of the thin films was investigated in detail. XRD analyses showed that under optimized conditions, (001)-oriented PZT/LNO/TiN heterostructures could be grown on either Si(001) or SiO₂/Si substrates. The (001)-textured PZT films had remnant polarizations as high as 23µC/cm², and also had a low coercive field. Up to 10¹⁰ switching cycles have been achieved in these PZT films.-
dc.descriptionSingapore-MIT Alliance (SMA)-
dc.format372225 bytes-
dc.formatapplication/pdf-
dc.languageen_US-
dc.relationAdvanced Materials for Micro- and Nano-Systems (AMMNS);-
dc.subjectpulsed laser deposition-
dc.subjectferroelectric thin films-
dc.subjectPZT-
dc.subjectcrystallographic orientation-
dc.subjectferroelectric properties-
dc.titleGrowth and Properties of (001)-oriented Pb(Zr₀.₅₂Ti₀.₄₈)O₃/LaNiO₃ Films on Si(001) Substrates with TiN Buffer Layers-
dc.typeArticle-
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