Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/3825
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dc.creatorJin, Lijuan-
dc.creatorPey, Kin Leong-
dc.creatorChoi, Wee Kiong-
dc.creatorFitzgerald, Eugene A.-
dc.creatorAntoniadis, Dimitri A.-
dc.creatorChi, D.Z.-
dc.date2003-12-13T16:23:54Z-
dc.date2003-12-13T16:23:54Z-
dc.date2004-01-
dc.date.accessioned2013-10-09T02:32:39Z-
dc.date.available2013-10-09T02:32:39Z-
dc.date.issued2013-10-09-
dc.identifierhttp://hdl.handle.net/1721.1/3825-
dc.identifier.urihttp://koha.mediu.edu.my:8181/xmlui/handle/1721-
dc.descriptionThe effect of Ni and Ni(Pt) alloy with ~5 and 10 at. % Pt on the agglomeration and Ge out-diffusion in Nickel germanosilicide formed on Si₀.₇₅Ge₀.₂₅(100) has been studied. A remarkable improvement in the agglomeration behavior with increasing Pt atomic percentage is observed by sheet resistance measurements and scanning electron microscopy (SEM). In addition, x-ray diffraction (XRD) shows that only NiSiGe or Ni(Pt)SiGe phase exists from 400 to 800°C. However, Ge out-diffusion from the monogermanosilicide grains is obvious at 600°C and 700°C for Ni/SiGe and Ni(Pt)(Pt at.%~10%)/SiGe, respectively, evident by XRD and micro-Raman spectroscopy. The improved melting temperature of Ni(Pt)SiGe solution compared to that of NiSiGe is the likely reason of seeing better surface morphology and suppressing Ge out-diffusion of the germanosilicide grains observed.-
dc.descriptionSingapore-MIT Alliance (SMA)-
dc.format1019837 bytes-
dc.formatapplication/pdf-
dc.languageen_US-
dc.relationAdvanced Materials for Micro- and Nano-Systems (AMMNS);-
dc.subjectagglomeration-
dc.subjectGe out-diffusion-
dc.titleEffect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide-
dc.typeArticle-
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