Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/3658
Title: Characterization and Modeling of Stress Evolution During Nickel Silicides Formation
Keywords: nickel silicide
stress evolution
Coble creep
Issue Date: 9-Oct-2013
Description: An curvature measurement technique was used to characterize the stress evolution during reaction of a Ni film and a silicon substrate to form nickel silicide. Stress changes were measured at each stage of the silicide growth. When the nickel films were subjected to long-time isothermal annealing, stresses that developed during silicide formation gradually relaxed. Fitting the experimental results with a kinetic model provides insight into the volumetric strain and relaxation behavior of the reacting film and the reaction product.
Singapore-MIT Alliance (SMA)
URI: http://koha.mediu.edu.my:8181/xmlui/handle/1721
Other Identifiers: http://hdl.handle.net/1721.1/3658
Appears in Collections:MIT Items

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