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http://dspace.mediu.edu.my:8181/xmlui/handle/10261/2815| Title: | Giant growth rate in nano-oxidation of p-silicon surfaces by using ethyl alcohol liquid bridges |
| Keywords: | Oxidation Organic Compounds Nanolithography Atomic Force Microscopy Water Silicon Elemental Semiconductors |
| Publisher: | American Institute of Physics |
| Description: | We demonstrate that local oxidation nanolithography can be performed in liquid environments different from aqueous solutions with a significant improvement in the aspect ratio of the fabricated motives. Here, we perform a comparative study of noncontact atomic force microscopy oxidation
experiments in water and ethyl alcohol. The growth rate of local oxides can be increased by almost an order of magnitude by using oxyanions from ethyl alcohol molecules. We propose that the enhanced growth rate is a consequence of the reduction of the trapped charges within the growing oxide. The present results open the possibility of using local oxidation nanolithography to directly fabricate vertical oxide structures while keeping lateral sizes in the nanometer range. This work was supported by the European Commission (MONA-LISA, G5RD-2000-00349). Peer reviewed |
| URI: | http://dspace.mediu.edu.my:8181/xmlui/handle/10261/2815 |
| Other Identifiers: | Applied Physics Letters 83, 12: 2339-2341 (2003) 0003-6951 http://hdl.handle.net/10261/2815 10.1063/1.1613799 |
| Appears in Collections: | Digital Csic |
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