Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/10261/2661
Full metadata record
DC FieldValueLanguage
dc.creatorGordillo Vázquez, Francisco J.-
dc.creatorHerrero, Víctor J.-
dc.creatorTanarro, Isabel-
dc.date2008-01-09T15:49:42Z-
dc.date2008-01-09T15:49:42Z-
dc.date2007-
dc.date.accessioned2017-01-31T00:59:39Z-
dc.date.available2017-01-31T00:59:39Z-
dc.identifierChemical Vapor Deposition 13(6-7): 267-279 (2007)-
dc.identifier0948-1907-
dc.identifierhttp://hdl.handle.net/10261/2661-
dc.identifier10.1002/cvde.200604034-
dc.identifier.urihttp://dspace.mediu.edu.my:8181/xmlui/handle/10261/2661-
dc.description13 pages, 9 figures.-
dc.descriptionLow-pressure, plasma-enhanced (PE)CVD is a powerful and versatile technique that has been used for thin-film deposition and surface treatment since the early 1960s. However, it is only recently that it has been used in applications other than the different stages of microelectronic circuit fabrication. Now, PECVD is being used in emerging applications due to new materials and process requirements in a wide variety of areas, such as biomedical applications, solar cells, fuel cell development, fusion research, or the synthesis of silicon nanocrystals showing efficient photoluminescence, useful for future solid-state light sources. These new scenarios have stimulated further development of novel PECVD diagnostic techniques, together with fundamental experimental and theoretical studies aimed at a better understanding of some of the basic processes underlying the plasma/surface interaction. This paper gives an overview of some new research areas where PECVD is finding promising applications.-
dc.descriptionFJGV acknowledges partial financial support from CSIC-CAM (Project No. 200550M016 and 200650M016) and MEC (Projects No. MAT2006-13006-C02-01 and ENE2006-14577-C04-03), VJH and IT acknowledge funding from MEC (Projects No. FTN-2003-08228-C03-03, FIS2004-00456 and ENE2006-14577-C04-03).-
dc.descriptionPeer reviewed-
dc.format22195 bytes-
dc.formatapplication/pdf-
dc.languageeng-
dc.publisherJohn Wiley & Sons-
dc.relationhttp://dx.doi.org/10.1002/cvde.200604034-
dc.rightsopenAccess-
dc.subjectBiomedical applications-
dc.subjectNanoparticles, inorganic-
dc.subjectNovel diagnostics-
dc.subjectPlasma-enhanced CVD (PECVD), low pressure-
dc.subjectPlasma-
dc.subjectSilica-
dc.titleFrom carbon nanostructures to new photoluminescence sources: an overview of new perspectives and emerging applications of low pressure PECVD-
dc.typeArtículo-
Appears in Collections:Digital Csic

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.